Normal view
MARC view
Silicon run implantation [videorecording] / a film by Ruth A. Carranza [in collaboration with the Stanford Nanofabrication Facility] ; producer/director, Ruth A. Carranza ; writers, Ruth Carranza, John Shott.
Publication details: Mountain View, CA : Ruth Carranza Productions : Silicon Run Productions, c2004, 2003.Description: 1 videodisc (31 min.) : sd., col. ; 4 3/4 inOther title:- Implantation
- TK7874 .S524 2004
Contents:
Narrator, Mary Dilts.Summary: An in-depth look at the process of ion implantation.
Introduction -- CMOS transistors -- High energy deep well implant -- Medium current threshold adjust implant -- Medium current halo implant -- Low energy/high current source & drain implant -- Rapid thermal anneal -- Ending & credits.
| Item type | Current library | Home library | Shelving location | Call number | Status | Date due | Barcode | |
|---|---|---|---|---|---|---|---|---|
DVDs
|
American University in Dubai | American University in Dubai | AUDIO & DVD Collection | DVD TK 7874 .S524 2004 (Browse shelf(Opens below)) | Available | 5047736 |
Browsing American University in Dubai shelves, Shelving location: AUDIO & DVD Collection Close shelf browser (Hides shelf browser)
| No cover image available | No cover image available | No cover image available | No cover image available | No cover image available | No cover image available | |||
| DVD TK 7871.85 .S5485 2004 Silicon run etch | DVD TK 7881.4 .L62 2004 Location sound for video with Wes Cavalier | DVD TK 1365 .J37 Frontline. Nuclear aftershocks | DVD TK 7874 .S524 2004 Silicon run implantation | DVD TK 7874 .S525 2004 Silicon run deposition | DVD TK 7874 .S55 2004 Silicon run. I. | DVD TK 7874 .S5526 2004 Silicon run lithography |
A presentation of National Science Foundation, Texas Instruments, Axcelis Technologies, Semiconductor Equipment and Materials International, Maricopa Advanced Technology Education Center, Stanford Nanofabrication Facility.
Introduction -- CMOS transistors -- High energy deep well implant -- Medium current threshold adjust implant -- Medium current halo implant -- Low energy/high current source & drain implant -- Rapid thermal anneal -- Ending & credits.
Narrator, Mary Dilts.
An in-depth look at the process of ion implantation.
DVD; NTSC.
There are no comments on this title.
Log in to your account to post a comment.