000			01974cgm a2200385Ia 4500
001			31626
003			AE-DuAU
005			20241122121748.0
007			vd cvaizu
008			050222t20042003cau031 vleng d
050	1	4	_aTK7874 _b.S524 2004
090			_aDVD TK 7874 .S524 2004
245	0	0	_aSilicon run implantation _h[videorecording] / _ca film by Ruth A. Carranza [in collaboration with the Stanford Nanofabrication Facility] ; producer/director, Ruth A. Carranza ; writers, Ruth Carranza, John Shott.
246	3	0	_aImplantation.
260			_aMountain View, CA : _bRuth Carranza Productions : _bSilicon Run Productions, _cc2004, 2003.
300			_a1 videodisc (31 min.) : _bsd., col. ; _c4 3/4 in.
500			_aA presentation of National Science Foundation, Texas Instruments, Axcelis Technologies, Semiconductor Equipment and Materials International, Maricopa Advanced Technology Education Center, Stanford Nanofabrication Facility.
505	0		_aIntroduction -- CMOS transistors -- High energy deep well implant -- Medium current threshold adjust implant -- Medium current halo implant -- Low energy/high current source & drain implant -- Rapid thermal anneal -- Ending & credits.
511	0		_aNarrator, Mary Dilts.
520			_aAn in-depth look at the process of ion implantation.
538			_aDVD; NTSC.
650		0	_aIon implantation. _953285
650		0	_aIntegrated circuits _xDesign and construction. _9183403
655		0	_aDocumentary films. _9183404
700	1		_aCarranza, Ruth A., _d1949- _9169460
700	1		_aShott, John. _9183405
700	1		_aDilts, Mary. _9183406
710	2		_aStanford Nanofabrication Facility. _9183407
710	2		_aRuth Carranza Productions. _9183408
710	2		_aSilicon Run Productions. _9169467
907			_a31626 _b02-28-11 _c02-28-11
942			_cDVD _01
998			_amedia _b02-28-11 _cm _dg _e- _feng _gcau _h0
945			_g0 _i5047736 _j0 _lmedia _o- _p493.15 _q- _r- _s- _t33 _u1 _v1 _w1 _x0 _yi12274379 _z02-28-11
999			_c31626 _d31626